
The global High Purity Copper for Sputtering Target Material market is projected to reach US$ 688.9 million in 2029, increasing from US$ 556.9 million in 2022, with the CAGR of 3.1% during the period of 2023 to 2029. Influencing issues, such as economy environments, COVID-19 and Russia-Ukraine War, have led to great market fluctuations in the past few years and are considered comprehensively in the whole High Purity Copper for Sputtering Target Material 91ÖÆÆ¬³§.
The High Purity Copper for Sputtering Target Material market, which involves the production and use of high-purity copper materials for sputtering targets in semiconductor and thin-film deposition applications, is influenced by several drivers and restrictions. These factors impact the growth and development of the market. Here are some key drivers and restrictions affecting the High Purity Copper for Sputtering Target Material market:
Drivers:
Semiconductor Industry Growth: The expansion of the semiconductor industry, driven by increasing demand for electronics and technological advancements, fuels the demand for high-purity copper sputtering targets.
Miniaturization of Electronics: Shrinking electronic components and the trend toward smaller, more powerful devices require high-quality copper sputtering targets for thin-film deposition processes.
Quality and Purity: High-purity copper is essential for achieving the desired electrical and physical properties in semiconductor manufacturing and thin-film deposition.
Research and Development: Ongoing research and development efforts in electronics and materials science drive the need for innovative and high-performance sputtering target materials.
Energy Efficiency: Copper sputtering targets are used in the production of energy-efficient coatings, such as low-emissivity (low-E) coatings for windows.
Environmental Regulations: The use of environmentally friendly and low-VOC (volatile organic compound) materials in thin-film deposition aligns with regulatory and environmental standards.
Safety Standards: Safety concerns in the semiconductor industry make high-purity copper sputtering targets a preferred choice for avoiding contamination and accidents.
Restrictions:
Cost: High-purity copper sputtering targets can be expensive, and their use contributes to the overall cost of semiconductor manufacturing and thin-film deposition.
Supply Chain Disruptions: Disruptions in the supply chain, including shortages of high-purity copper raw materials or transportation challenges, can affect the availability of sputtering target materials.
Regulatory Compliance: Meeting stringent regulatory standards and safety requirements for high-purity copper materials is essential but can be challenging for manufacturers.
Environmental Impact: Disposal of high-purity copper sputtering targets and their potential environmental impact require proper waste management practices.
Technological Advancements: Keeping up with evolving semiconductor and thin-film deposition technologies and their material requirements necessitates ongoing innovation.
Global Competition: The market for high-purity copper sputtering target materials is competitive, with many suppliers vying for market share.
Quality Control: Maintaining consistent quality and purity levels across sputtering target materials is crucial for ensuring their performance in thin-film deposition processes.
Despite these restrictions, the High Purity Copper for Sputtering Target Material market is expected to continue growing as the semiconductor and electronics industries advance. Addressing challenges related to cost, supply chain disruptions, regulatory compliance, environmental impact, technological advancements, quality control, and global competition while focusing on product innovation and maintaining high quality standards will be essential for the sustained growth of this market.
Report Scope
This report, based on historical analysis (2018-2022) and forecast calculation (2023-2029), aims to help readers to get a comprehensive understanding of global High Purity Copper for Sputtering Target Material market with multiple angles, which provides sufficient supports to readers’ strategy and decision making.
By Company
JX Nippon Mining & Metals
Mitsubishi Materials
Hitachi Metals
Honeywell
Guoxi Ultra Pure
Jinchaun Group Co,. Ltd.
GRIKIN Advanced Material Co., Ltd.
Ningbo Weitai
Segment by Type
5N
6N
7N
Others
Segment by Application
Semiconductor
Flat Panel Display
Thin Film Solar Cell
Others
Production by Region
North America
Europe
China
Japan
Consumption by Region
North America
United States
Canada
Europe
Germany
France
U.K.
Italy
Russia
Asia-Pacific
China
Japan
South Korea
China Taiwan
Southeast Asia
India
Latin America, Middle East & Africa
Mexico
Brazil
Turkey
GCC Countries
The High Purity Copper for Sputtering Target Material report covers below items:
Chapter 1: Product Basic Information (Definition, type and application)
Chapter 2: Manufacturers’ Competition Patterns
Chapter 3: Production Region Distribution and Analysis
Chapter 4: Country Level Sales Analysis
Chapter 5: Product Type Analysis
Chapter 6: Product Application Analysis
Chapter 7: Manufacturers’ Outline
Chapter 8: Industry Chain, Market Channel and Customer Analysis
Chapter 9: Market Opportunities and Challenges
Chapter 10: Market Conclusions
Chapter 11: Research Methodology and Data Source
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1 High Purity Copper for Sputtering Target Material Market Overview
1.1 Product Definition
1.2 High Purity Copper for Sputtering Target Material Segment by Type
1.2.1 Global High Purity Copper for Sputtering Target Material Market Value Growth Rate Analysis by Type 2022 VS 2029
1.2.2 5N
1.2.3 6N
1.2.4 7N
1.2.5 Others
1.3 High Purity Copper for Sputtering Target Material Segment by Application
1.3.1 Global High Purity Copper for Sputtering Target Material Market Value Growth Rate Analysis by Application: 2022 VS 2029
1.3.2 Semiconductor
1.3.3 Flat Panel Display
1.3.4 Thin Film Solar Cell
1.3.5 Others
1.4 Global Market Growth Prospects
1.4.1 Global High Purity Copper for Sputtering Target Material Production Value Estimates and Forecasts (2018-2029)
1.4.2 Global High Purity Copper for Sputtering Target Material Production Capacity Estimates and Forecasts (2018-2029)
1.4.3 Global High Purity Copper for Sputtering Target Material Production Estimates and Forecasts (2018-2029)
1.4.4 Global High Purity Copper for Sputtering Target Material Market Average Price Estimates and Forecasts (2018-2029)
1.5 Assumptions and Limitations
2 Market Competition by Manufacturers
2.1 Global High Purity Copper for Sputtering Target Material Production Market Share by Manufacturers (2018-2023)
2.2 Global High Purity Copper for Sputtering Target Material Production Value Market Share by Manufacturers (2018-2023)
2.3 Global Key Players of High Purity Copper for Sputtering Target Material, Industry Ranking, 2021 VS 2022 VS 2023
2.4 Global High Purity Copper for Sputtering Target Material Market Share by Company Type (Tier 1, Tier 2 and Tier 3)
2.5 Global High Purity Copper for Sputtering Target Material Average Price by Manufacturers (2018-2023)
2.6 Global Key Manufacturers of High Purity Copper for Sputtering Target Material, Manufacturing Base Distribution and Headquarters
2.7 Global Key Manufacturers of High Purity Copper for Sputtering Target Material, Product Offered and Application
2.8 Global Key Manufacturers of High Purity Copper for Sputtering Target Material, Date of Enter into This Industry
2.9 High Purity Copper for Sputtering Target Material Market Competitive Situation and Trends
2.9.1 High Purity Copper for Sputtering Target Material Market Concentration Rate
2.9.2 Global 5 and 10 Largest High Purity Copper for Sputtering Target Material Players Market Share by Revenue
2.10 Mergers & Acquisitions, Expansion
3 High Purity Copper for Sputtering Target Material Production by Region
3.1 Global High Purity Copper for Sputtering Target Material Production Value Estimates and Forecasts by Region: 2018 VS 2022 VS 2029
3.2 Global High Purity Copper for Sputtering Target Material Production Value by Region (2018-2029)
3.2.1 Global High Purity Copper for Sputtering Target Material Production Value Market Share by Region (2018-2023)
3.2.2 Global Forecasted Production Value of High Purity Copper for Sputtering Target Material by Region (2024-2029)
3.3 Global High Purity Copper for Sputtering Target Material Production Estimates and Forecasts by Region: 2018 VS 2022 VS 2029
3.4 Global High Purity Copper for Sputtering Target Material Production by Region (2018-2029)
3.4.1 Global High Purity Copper for Sputtering Target Material Production Market Share by Region (2018-2023)
3.4.2 Global Forecasted Production of High Purity Copper for Sputtering Target Material by Region (2024-2029)
3.5 Global High Purity Copper for Sputtering Target Material Market Price Analysis by Region (2018-2023)
3.6 Global High Purity Copper for Sputtering Target Material Production and Value, Year-over-Year Growth
3.6.1 North America High Purity Copper for Sputtering Target Material Production Value Estimates and Forecasts (2018-2029)
3.6.2 Europe High Purity Copper for Sputtering Target Material Production Value Estimates and Forecasts (2018-2029)
3.6.3 China High Purity Copper for Sputtering Target Material Production Value Estimates and Forecasts (2018-2029)
3.6.4 Japan High Purity Copper for Sputtering Target Material Production Value Estimates and Forecasts (2018-2029)
4 High Purity Copper for Sputtering Target Material Consumption by Region
4.1 Global High Purity Copper for Sputtering Target Material Consumption Estimates and Forecasts by Region: 2018 VS 2022 VS 2029
4.2 Global High Purity Copper for Sputtering Target Material Consumption by Region (2018-2029)
4.2.1 Global High Purity Copper for Sputtering Target Material Consumption by Region (2018-2023)
4.2.2 Global High Purity Copper for Sputtering Target Material Forecasted Consumption by Region (2024-2029)
4.3 North America
4.3.1 North America High Purity Copper for Sputtering Target Material Consumption Growth Rate by Country: 2018 VS 2022 VS 2029
4.3.2 North America High Purity Copper for Sputtering Target Material Consumption by Country (2018-2029)
4.3.3 United States
4.3.4 Canada
4.4 Europe
4.4.1 Europe High Purity Copper for Sputtering Target Material Consumption Growth Rate by Country: 2018 VS 2022 VS 2029
4.4.2 Europe High Purity Copper for Sputtering Target Material Consumption by Country (2018-2029)
4.4.3 Germany
4.4.4 France
4.4.5 U.K.
4.4.6 Italy
4.4.7 Russia
4.5 Asia Pacific
4.5.1 Asia Pacific High Purity Copper for Sputtering Target Material Consumption Growth Rate by Region: 2018 VS 2022 VS 2029
4.5.2 Asia Pacific High Purity Copper for Sputtering Target Material Consumption by Region (2018-2029)
4.5.3 China
4.5.4 Japan
4.5.5 South Korea
4.5.6 China Taiwan
4.5.7 Southeast Asia
4.5.8 India
4.6 Latin America, Middle East & Africa
4.6.1 Latin America, Middle East & Africa High Purity Copper for Sputtering Target Material Consumption Growth Rate by Country: 2018 VS 2022 VS 2029
4.6.2 Latin America, Middle East & Africa High Purity Copper for Sputtering Target Material Consumption by Country (2018-2029)
4.6.3 Mexico
4.6.4 Brazil
4.6.5 Turkey
5 Segment by Type
5.1 Global High Purity Copper for Sputtering Target Material Production by Type (2018-2029)
5.1.1 Global High Purity Copper for Sputtering Target Material Production by Type (2018-2023)
5.1.2 Global High Purity Copper for Sputtering Target Material Production by Type (2024-2029)
5.1.3 Global High Purity Copper for Sputtering Target Material Production Market Share by Type (2018-2029)
5.2 Global High Purity Copper for Sputtering Target Material Production Value by Type (2018-2029)
5.2.1 Global High Purity Copper for Sputtering Target Material Production Value by Type (2018-2023)
5.2.2 Global High Purity Copper for Sputtering Target Material Production Value by Type (2024-2029)
5.2.3 Global High Purity Copper for Sputtering Target Material Production Value Market Share by Type (2018-2029)
5.3 Global High Purity Copper for Sputtering Target Material Price by Type (2018-2029)
6 Segment by Application
6.1 Global High Purity Copper for Sputtering Target Material Production by Application (2018-2029)
6.1.1 Global High Purity Copper for Sputtering Target Material Production by Application (2018-2023)
6.1.2 Global High Purity Copper for Sputtering Target Material Production by Application (2024-2029)
6.1.3 Global High Purity Copper for Sputtering Target Material Production Market Share by Application (2018-2029)
6.2 Global High Purity Copper for Sputtering Target Material Production Value by Application (2018-2029)
6.2.1 Global High Purity Copper for Sputtering Target Material Production Value by Application (2018-2023)
6.2.2 Global High Purity Copper for Sputtering Target Material Production Value by Application (2024-2029)
6.2.3 Global High Purity Copper for Sputtering Target Material Production Value Market Share by Application (2018-2029)
6.3 Global High Purity Copper for Sputtering Target Material Price by Application (2018-2029)
7 Key Companies Profiled
7.1 JX Nippon Mining & Metals
7.1.1 JX Nippon Mining & Metals High Purity Copper for Sputtering Target Material Corporation Information
7.1.2 JX Nippon Mining & Metals High Purity Copper for Sputtering Target Material Product Portfolio
7.1.3 JX Nippon Mining & Metals High Purity Copper for Sputtering Target Material Production, Value, Price and Gross Margin (2018-2023)
7.1.4 JX Nippon Mining & Metals Main Business and Markets Served
7.1.5 JX Nippon Mining & Metals Recent Developments/Updates
7.2 Mitsubishi Materials
7.2.1 Mitsubishi Materials High Purity Copper for Sputtering Target Material Corporation Information
7.2.2 Mitsubishi Materials High Purity Copper for Sputtering Target Material Product Portfolio
7.2.3 Mitsubishi Materials High Purity Copper for Sputtering Target Material Production, Value, Price and Gross Margin (2018-2023)
7.2.4 Mitsubishi Materials Main Business and Markets Served
7.2.5 Mitsubishi Materials Recent Developments/Updates
7.3 Hitachi Metals
7.3.1 Hitachi Metals High Purity Copper for Sputtering Target Material Corporation Information
7.3.2 Hitachi Metals High Purity Copper for Sputtering Target Material Product Portfolio
7.3.3 Hitachi Metals High Purity Copper for Sputtering Target Material Production, Value, Price and Gross Margin (2018-2023)
7.3.4 Hitachi Metals Main Business and Markets Served
7.3.5 Hitachi Metals Recent Developments/Updates
7.4 Honeywell
7.4.1 Honeywell High Purity Copper for Sputtering Target Material Corporation Information
7.4.2 Honeywell High Purity Copper for Sputtering Target Material Product Portfolio
7.4.3 Honeywell High Purity Copper for Sputtering Target Material Production, Value, Price and Gross Margin (2018-2023)
7.4.4 Honeywell Main Business and Markets Served
7.4.5 Honeywell Recent Developments/Updates
7.5 Guoxi Ultra Pure
7.5.1 Guoxi Ultra Pure High Purity Copper for Sputtering Target Material Corporation Information
7.5.2 Guoxi Ultra Pure High Purity Copper for Sputtering Target Material Product Portfolio
7.5.3 Guoxi Ultra Pure High Purity Copper for Sputtering Target Material Production, Value, Price and Gross Margin (2018-2023)
7.5.4 Guoxi Ultra Pure Main Business and Markets Served
7.5.5 Guoxi Ultra Pure Recent Developments/Updates
7.6 Jinchaun Group Co,. Ltd.
7.6.1 Jinchaun Group Co,. Ltd. High Purity Copper for Sputtering Target Material Corporation Information
7.6.2 Jinchaun Group Co,. Ltd. High Purity Copper for Sputtering Target Material Product Portfolio
7.6.3 Jinchaun Group Co,. Ltd. High Purity Copper for Sputtering Target Material Production, Value, Price and Gross Margin (2018-2023)
7.6.4 Jinchaun Group Co,. Ltd. Main Business and Markets Served
7.6.5 Jinchaun Group Co,. Ltd. Recent Developments/Updates
7.7 GRIKIN Advanced Material Co., Ltd.
7.7.1 GRIKIN Advanced Material Co., Ltd. High Purity Copper for Sputtering Target Material Corporation Information
7.7.2 GRIKIN Advanced Material Co., Ltd. High Purity Copper for Sputtering Target Material Product Portfolio
7.7.3 GRIKIN Advanced Material Co., Ltd. High Purity Copper for Sputtering Target Material Production, Value, Price and Gross Margin (2018-2023)
7.7.4 GRIKIN Advanced Material Co., Ltd. Main Business and Markets Served
7.7.5 GRIKIN Advanced Material Co., Ltd. Recent Developments/Updates
7.8 Ningbo Weitai
7.8.1 Ningbo Weitai High Purity Copper for Sputtering Target Material Corporation Information
7.8.2 Ningbo Weitai High Purity Copper for Sputtering Target Material Product Portfolio
7.8.3 Ningbo Weitai High Purity Copper for Sputtering Target Material Production, Value, Price and Gross Margin (2018-2023)
7.8.4 Ningbo Weitai Main Business and Markets Served
7.7.5 Ningbo Weitai Recent Developments/Updates
8 Industry Chain and Sales Channels Analysis
8.1 High Purity Copper for Sputtering Target Material Industry Chain Analysis
8.2 High Purity Copper for Sputtering Target Material Key Raw Materials
8.2.1 Key Raw Materials
8.2.2 Raw Materials Key Suppliers
8.3 High Purity Copper for Sputtering Target Material Production Mode & Process
8.4 High Purity Copper for Sputtering Target Material Sales and Marketing
8.4.1 High Purity Copper for Sputtering Target Material Sales Channels
8.4.2 High Purity Copper for Sputtering Target Material Distributors
8.5 High Purity Copper for Sputtering Target Material Customers
9 High Purity Copper for Sputtering Target Material Market Dynamics
9.1 High Purity Copper for Sputtering Target Material Industry Trends
9.2 High Purity Copper for Sputtering Target Material Market Drivers
9.3 High Purity Copper for Sputtering Target Material Market Challenges
9.4 High Purity Copper for Sputtering Target Material Market Restraints
10 Research Finding and Conclusion
11 Methodology and Data Source
11.1 Methodology/Research Approach
11.1.1 Research Programs/Design
11.1.2 Market Size Estimation
11.1.3 Market Breakdown and Data Triangulation
11.2 Data Source
11.2.1 Secondary Sources
11.2.2 Primary Sources
11.3 Author List
11.4 Disclaimer
JX Nippon Mining & Metals
Mitsubishi Materials
Hitachi Metals
Honeywell
Guoxi Ultra Pure
Jinchaun Group Co,. Ltd.
GRIKIN Advanced Material Co., Ltd.
Ningbo Weitai
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*If Applicable.
