Global High Purity Sputtering Target for Semiconductor Market Research Report 2023

Publication ID:

PB510233822

Publication Date:

October 31, 2023

Pages:

101

Publisher:

MRRPB5

Countries:

Global [1]

USD 2,900.00

Specialty Chemicals [2]

Manufacturing (Chemicals) [3]

Chemicals [4]

Description:

The global High Purity Sputtering Target for Semiconductor market is projected to reach US$ 1346.6 million in 2029, increasing from US$ 1100.3 million in 2022, with the CAGR of 3.0% during the period of 2023 to 2029. Influencing issues, such as economy environments, COVID-19 and Russia-Ukraine War, have led to great market fluctuations in the past few years and are considered comprehensively in the whole High Purity Sputtering Target for Semiconductor 91制片厂.
Following a strong growth of 26.2 percent in the year 2021, WSTS revised it down to a single digit growth for the worldwide semiconductor market in 2022 with a total size of US$580 billion, up 4.4 percent. WSTS lowered growth estimation as inflation rises and end markets seeing weaker demand, especially those exposed to consumer spending. While some major categories are still double-digit year-over-year growth in 2022, led by Analog with 20.8 percent, Sensors with 16.3 percent, and Logic with 14.5 percent growth. Memory declined with 12.6 percent year over year. In 2022, all geographical regions showed double-digit growth except Asia Pacific. The largest region, Asia Pacific, declined 2.0 percent. Sales in the Americas were US$142.1 billion, up 17.0% year-on-year, sales in Europe were US$53.8 billion, up 12.6% year-on-year, and sales in Japan were US$48.1 billion, up 10.0% year-on-year. However, sales in the largest Asia-Pacific region were US$336.2 billion, down 2.0% year-on-year.
Report Scope
This report, based on historical analysis (2018-2022) and forecast calculation (2023-2029), aims to help readers to get a comprehensive understanding of global High Purity Sputtering Target for Semiconductor market with multiple angles, which provides sufficient supports to readers鈥� strategy and decision making.
By Company
Linde
JX Nippon Mining & Metals Corporation
Materion
Honeywell
Ningbo Jiangfeng
ULVAC
TOSOH
Luvata
Hitachi Metals
Sumitomo Chemical
Plansee SE
FURAYA Metals Co., Ltd
Luoyang Sifon Electronic Materials
Changzhou Sujing Electronic Material
Umicore Thin Film Products
GRIKIN Advanced Material Co., Ltd.
Advantec
Angstrom Sciences
Segment by Type
Metal Sputtering Target Material
Non-metal Sputtering Target Material
Alloy Sputtering Target Material
Segment by Application
Consumer Electronics
Vehicle Electronics
Communication Electronics
Others
Production by Region
North America
Europe
China
Japan
Consumption by Region
North America
United States
Canada
Europe
Germany
France
U.K.
Italy
Russia
Asia-Pacific
China
Japan
South Korea
China Taiwan
Southeast Asia
India
Latin America, Middle East & Africa
Mexico
Brazil
Turkey
GCC Countries
The High Purity Sputtering Target for Semiconductor report covers below items:
Chapter 1: Product Basic Information (Definition, type and application)
Chapter 2: Manufacturers鈥� Competition Patterns
Chapter 3: Production Region Distribution and Analysis
Chapter 4: Country Level Sales Analysis
Chapter 5: Product Type Analysis
Chapter 6: Product Application Analysis
Chapter 7: Manufacturers鈥� Outline
Chapter 8: Industry Chain, Market Channel and Customer Analysis
Chapter 9: Market Opportunities and Challenges
Chapter 10: Market Conclusions
Chapter 11: Research Methodology and Data Source

Please Note - This is an on demand report and will be delivered in 2 business days (48 hours) post payment.

Table Of Contents:

1 High Purity Sputtering Target for Semiconductor Market Overview
1.1 Product Definition
1.2 High Purity Sputtering Target for Semiconductor Segment by Type
1.2.1 Global High Purity Sputtering Target for Semiconductor Market Value Growth Rate Analysis by Type 2022 VS 2029
1.2.2 Metal Sputtering Target Material
1.2.3 Non-metal Sputtering Target Material
1.2.4 Alloy Sputtering Target Material
1.3 High Purity Sputtering Target for Semiconductor Segment by Application
1.3.1 Global High Purity Sputtering Target for Semiconductor Market Value Growth Rate Analysis by Application: 2022 VS 2029
1.3.2 Consumer Electronics
1.3.3 Vehicle Electronics
1.3.4 Communication Electronics
1.3.5 Others
1.4 Global Market Growth Prospects
1.4.1 Global High Purity Sputtering Target for Semiconductor Production Value Estimates and Forecasts (2018-2029)
1.4.2 Global High Purity Sputtering Target for Semiconductor Production Capacity Estimates and Forecasts (2018-2029)
1.4.3 Global High Purity Sputtering Target for Semiconductor Production Estimates and Forecasts (2018-2029)
1.4.4 Global High Purity Sputtering Target for Semiconductor Market Average Price Estimates and Forecasts (2018-2029)
1.5 Assumptions and Limitations
2 Market Competition by Manufacturers
2.1 Global High Purity Sputtering Target for Semiconductor Production Market Share by Manufacturers (2018-2023)
2.2 Global High Purity Sputtering Target for Semiconductor Production Value Market Share by Manufacturers (2018-2023)
2.3 Global Key Players of High Purity Sputtering Target for Semiconductor, Industry Ranking, 2021 VS 2022 VS 2023
2.4 Global High Purity Sputtering Target for Semiconductor Market Share by Company Type (Tier 1, Tier 2 and Tier 3)
2.5 Global High Purity Sputtering Target for Semiconductor Average Price by Manufacturers (2018-2023)
2.6 Global Key Manufacturers of High Purity Sputtering Target for Semiconductor, Manufacturing Base Distribution and Headquarters
2.7 Global Key Manufacturers of High Purity Sputtering Target for Semiconductor, Product Offered and Application
2.8 Global Key Manufacturers of High Purity Sputtering Target for Semiconductor, Date of Enter into This Industry
2.9 High Purity Sputtering Target for Semiconductor Market Competitive Situation and Trends
2.9.1 High Purity Sputtering Target for Semiconductor Market Concentration Rate
2.9.2 Global 5 and 10 Largest High Purity Sputtering Target for Semiconductor Players Market Share by Revenue
2.10 Mergers & Acquisitions, Expansion
3 High Purity Sputtering Target for Semiconductor Production by Region
3.1 Global High Purity Sputtering Target for Semiconductor Production Value Estimates and Forecasts by Region: 2018 VS 2022 VS 2029
3.2 Global High Purity Sputtering Target for Semiconductor Production Value by Region (2018-2029)
3.2.1 Global High Purity Sputtering Target for Semiconductor Production Value Market Share by Region (2018-2023)
3.2.2 Global Forecasted Production Value of High Purity Sputtering Target for Semiconductor by Region (2024-2029)
3.3 Global High Purity Sputtering Target for Semiconductor Production Estimates and Forecasts by Region: 2018 VS 2022 VS 2029
3.4 Global High Purity Sputtering Target for Semiconductor Production by Region (2018-2029)
3.4.1 Global High Purity Sputtering Target for Semiconductor Production Market Share by Region (2018-2023)
3.4.2 Global Forecasted Production of High Purity Sputtering Target for Semiconductor by Region (2024-2029)
3.5 Global High Purity Sputtering Target for Semiconductor Market Price Analysis by Region (2018-2023)
3.6 Global High Purity Sputtering Target for Semiconductor Production and Value, Year-over-Year Growth
3.6.1 North America High Purity Sputtering Target for Semiconductor Production Value Estimates and Forecasts (2018-2029)
3.6.2 Europe High Purity Sputtering Target for Semiconductor Production Value Estimates and Forecasts (2018-2029)
3.6.3 China High Purity Sputtering Target for Semiconductor Production Value Estimates and Forecasts (2018-2029)
3.6.4 Japan High Purity Sputtering Target for Semiconductor Production Value Estimates and Forecasts (2018-2029)
4 High Purity Sputtering Target for Semiconductor Consumption by Region
4.1 Global High Purity Sputtering Target for Semiconductor Consumption Estimates and Forecasts by Region: 2018 VS 2022 VS 2029
4.2 Global High Purity Sputtering Target for Semiconductor Consumption by Region (2018-2029)
4.2.1 Global High Purity Sputtering Target for Semiconductor Consumption by Region (2018-2023)
4.2.2 Global High Purity Sputtering Target for Semiconductor Forecasted Consumption by Region (2024-2029)
4.3 North America
4.3.1 North America High Purity Sputtering Target for Semiconductor Consumption Growth Rate by Country: 2018 VS 2022 VS 2029
4.3.2 North America High Purity Sputtering Target for Semiconductor Consumption by Country (2018-2029)
4.3.3 United States
4.3.4 Canada
4.4 Europe
4.4.1 Europe High Purity Sputtering Target for Semiconductor Consumption Growth Rate by Country: 2018 VS 2022 VS 2029
4.4.2 Europe High Purity Sputtering Target for Semiconductor Consumption by Country (2018-2029)
4.4.3 Germany
4.4.4 France
4.4.5 U.K.
4.4.6 Italy
4.4.7 Russia
4.5 Asia Pacific
4.5.1 Asia Pacific High Purity Sputtering Target for Semiconductor Consumption Growth Rate by Region: 2018 VS 2022 VS 2029
4.5.2 Asia Pacific High Purity Sputtering Target for Semiconductor Consumption by Region (2018-2029)
4.5.3 China
4.5.4 Japan
4.5.5 South Korea
4.5.6 China Taiwan
4.5.7 Southeast Asia
4.5.8 India
4.6 Latin America, Middle East & Africa
4.6.1 Latin America, Middle East & Africa High Purity Sputtering Target for Semiconductor Consumption Growth Rate by Country: 2018 VS 2022 VS 2029
4.6.2 Latin America, Middle East & Africa High Purity Sputtering Target for Semiconductor Consumption by Country (2018-2029)
4.6.3 Mexico
4.6.4 Brazil
4.6.5 Turkey
4.6.6 GCC Countries
5 Segment by Type
5.1 Global High Purity Sputtering Target for Semiconductor Production by Type (2018-2029)
5.1.1 Global High Purity Sputtering Target for Semiconductor Production by Type (2018-2023)
5.1.2 Global High Purity Sputtering Target for Semiconductor Production by Type (2024-2029)
5.1.3 Global High Purity Sputtering Target for Semiconductor Production Market Share by Type (2018-2029)
5.2 Global High Purity Sputtering Target for Semiconductor Production Value by Type (2018-2029)
5.2.1 Global High Purity Sputtering Target for Semiconductor Production Value by Type (2018-2023)
5.2.2 Global High Purity Sputtering Target for Semiconductor Production Value by Type (2024-2029)
5.2.3 Global High Purity Sputtering Target for Semiconductor Production Value Market Share by Type (2018-2029)
5.3 Global High Purity Sputtering Target for Semiconductor Price by Type (2018-2029)
6 Segment by Application
6.1 Global High Purity Sputtering Target for Semiconductor Production by Application (2018-2029)
6.1.1 Global High Purity Sputtering Target for Semiconductor Production by Application (2018-2023)
6.1.2 Global High Purity Sputtering Target for Semiconductor Production by Application (2024-2029)
6.1.3 Global High Purity Sputtering Target for Semiconductor Production Market Share by Application (2018-2029)
6.2 Global High Purity Sputtering Target for Semiconductor Production Value by Application (2018-2029)
6.2.1 Global High Purity Sputtering Target for Semiconductor Production Value by Application (2018-2023)
6.2.2 Global High Purity Sputtering Target for Semiconductor Production Value by Application (2024-2029)
6.2.3 Global High Purity Sputtering Target for Semiconductor Production Value Market Share by Application (2018-2029)
6.3 Global High Purity Sputtering Target for Semiconductor Price by Application (2018-2029)
7 Key Companies Profiled
7.1 Linde
7.1.1 Linde High Purity Sputtering Target for Semiconductor Corporation Information
7.1.2 Linde High Purity Sputtering Target for Semiconductor Product Portfolio
7.1.3 Linde High Purity Sputtering Target for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.1.4 Linde Main Business and Markets Served
7.1.5 Linde Recent Developments/Updates
7.2 JX Nippon Mining & Metals Corporation
7.2.1 JX Nippon Mining & Metals Corporation High Purity Sputtering Target for Semiconductor Corporation Information
7.2.2 JX Nippon Mining & Metals Corporation High Purity Sputtering Target for Semiconductor Product Portfolio
7.2.3 JX Nippon Mining & Metals Corporation High Purity Sputtering Target for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.2.4 JX Nippon Mining & Metals Corporation Main Business and Markets Served
7.2.5 JX Nippon Mining & Metals Corporation Recent Developments/Updates
7.3 Materion
7.3.1 Materion High Purity Sputtering Target for Semiconductor Corporation Information
7.3.2 Materion High Purity Sputtering Target for Semiconductor Product Portfolio
7.3.3 Materion High Purity Sputtering Target for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.3.4 Materion Main Business and Markets Served
7.3.5 Materion Recent Developments/Updates
7.4 Honeywell
7.4.1 Honeywell High Purity Sputtering Target for Semiconductor Corporation Information
7.4.2 Honeywell High Purity Sputtering Target for Semiconductor Product Portfolio
7.4.3 Honeywell High Purity Sputtering Target for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.4.4 Honeywell Main Business and Markets Served
7.4.5 Honeywell Recent Developments/Updates
7.5 Ningbo Jiangfeng
7.5.1 Ningbo Jiangfeng High Purity Sputtering Target for Semiconductor Corporation Information
7.5.2 Ningbo Jiangfeng High Purity Sputtering Target for Semiconductor Product Portfolio
7.5.3 Ningbo Jiangfeng High Purity Sputtering Target for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.5.4 Ningbo Jiangfeng Main Business and Markets Served
7.5.5 Ningbo Jiangfeng Recent Developments/Updates
7.6 ULVAC
7.6.1 ULVAC High Purity Sputtering Target for Semiconductor Corporation Information
7.6.2 ULVAC High Purity Sputtering Target for Semiconductor Product Portfolio
7.6.3 ULVAC High Purity Sputtering Target for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.6.4 ULVAC Main Business and Markets Served
7.6.5 ULVAC Recent Developments/Updates
7.7 TOSOH
7.7.1 TOSOH High Purity Sputtering Target for Semiconductor Corporation Information
7.7.2 TOSOH High Purity Sputtering Target for Semiconductor Product Portfolio
7.7.3 TOSOH High Purity Sputtering Target for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.7.4 TOSOH Main Business and Markets Served
7.7.5 TOSOH Recent Developments/Updates
7.8 Luvata
7.8.1 Luvata High Purity Sputtering Target for Semiconductor Corporation Information
7.8.2 Luvata High Purity Sputtering Target for Semiconductor Product Portfolio
7.8.3 Luvata High Purity Sputtering Target for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.8.4 Luvata Main Business and Markets Served
7.7.5 Luvata Recent Developments/Updates
7.9 Hitachi Metals
7.9.1 Hitachi Metals High Purity Sputtering Target for Semiconductor Corporation Information
7.9.2 Hitachi Metals High Purity Sputtering Target for Semiconductor Product Portfolio
7.9.3 Hitachi Metals High Purity Sputtering Target for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.9.4 Hitachi Metals Main Business and Markets Served
7.9.5 Hitachi Metals Recent Developments/Updates
7.10 Sumitomo Chemical
7.10.1 Sumitomo Chemical High Purity Sputtering Target for Semiconductor Corporation Information
7.10.2 Sumitomo Chemical High Purity Sputtering Target for Semiconductor Product Portfolio
7.10.3 Sumitomo Chemical High Purity Sputtering Target for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.10.4 Sumitomo Chemical Main Business and Markets Served
7.10.5 Sumitomo Chemical Recent Developments/Updates
7.11 Plansee SE
7.11.1 Plansee SE High Purity Sputtering Target for Semiconductor Corporation Information
7.11.2 Plansee SE High Purity Sputtering Target for Semiconductor Product Portfolio
7.11.3 Plansee SE High Purity Sputtering Target for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.11.4 Plansee SE Main Business and Markets Served
7.11.5 Plansee SE Recent Developments/Updates
7.12 FURAYA Metals Co., Ltd
7.12.1 FURAYA Metals Co., Ltd High Purity Sputtering Target for Semiconductor Corporation Information
7.12.2 FURAYA Metals Co., Ltd High Purity Sputtering Target for Semiconductor Product Portfolio
7.12.3 FURAYA Metals Co., Ltd High Purity Sputtering Target for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.12.4 FURAYA Metals Co., Ltd Main Business and Markets Served
7.12.5 FURAYA Metals Co., Ltd Recent Developments/Updates
7.13 Luoyang Sifon Electronic Materials
7.13.1 Luoyang Sifon Electronic Materials High Purity Sputtering Target for Semiconductor Corporation Information
7.13.2 Luoyang Sifon Electronic Materials High Purity Sputtering Target for Semiconductor Product Portfolio
7.13.3 Luoyang Sifon Electronic Materials High Purity Sputtering Target for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.13.4 Luoyang Sifon Electronic Materials Main Business and Markets Served
7.13.5 Luoyang Sifon Electronic Materials Recent Developments/Updates
7.14 Changzhou Sujing Electronic Material
7.14.1 Changzhou Sujing Electronic Material High Purity Sputtering Target for Semiconductor Corporation Information
7.14.2 Changzhou Sujing Electronic Material High Purity Sputtering Target for Semiconductor Product Portfolio
7.14.3 Changzhou Sujing Electronic Material High Purity Sputtering Target for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.14.4 Changzhou Sujing Electronic Material Main Business and Markets Served
7.14.5 Changzhou Sujing Electronic Material Recent Developments/Updates
7.15 Umicore Thin Film Products
7.15.1 Umicore Thin Film Products High Purity Sputtering Target for Semiconductor Corporation Information
7.15.2 Umicore Thin Film Products High Purity Sputtering Target for Semiconductor Product Portfolio
7.15.3 Umicore Thin Film Products High Purity Sputtering Target for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.15.4 Umicore Thin Film Products Main Business and Markets Served
7.15.5 Umicore Thin Film Products Recent Developments/Updates
7.16 GRIKIN Advanced Material Co., Ltd.
7.16.1 GRIKIN Advanced Material Co., Ltd. High Purity Sputtering Target for Semiconductor Corporation Information
7.16.2 GRIKIN Advanced Material Co., Ltd. High Purity Sputtering Target for Semiconductor Product Portfolio
7.16.3 GRIKIN Advanced Material Co., Ltd. High Purity Sputtering Target for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.16.4 GRIKIN Advanced Material Co., Ltd. Main Business and Markets Served
7.16.5 GRIKIN Advanced Material Co., Ltd. Recent Developments/Updates
7.17 Advantec
7.17.1 Advantec High Purity Sputtering Target for Semiconductor Corporation Information
7.17.2 Advantec High Purity Sputtering Target for Semiconductor Product Portfolio
7.17.3 Advantec High Purity Sputtering Target for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.17.4 Advantec Main Business and Markets Served
7.17.5 Advantec Recent Developments/Updates
7.18 Angstrom Sciences
7.18.1 Angstrom Sciences High Purity Sputtering Target for Semiconductor Corporation Information
7.18.2 Angstrom Sciences High Purity Sputtering Target for Semiconductor Product Portfolio
7.18.3 Angstrom Sciences High Purity Sputtering Target for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.18.4 Angstrom Sciences Main Business and Markets Served
7.18.5 Angstrom Sciences Recent Developments/Updates
8 Industry Chain and Sales Channels Analysis
8.1 High Purity Sputtering Target for Semiconductor Industry Chain Analysis
8.2 High Purity Sputtering Target for Semiconductor Key Raw Materials
8.2.1 Key Raw Materials
8.2.2 Raw Materials Key Suppliers
8.3 High Purity Sputtering Target for Semiconductor Production Mode & Process
8.4 High Purity Sputtering Target for Semiconductor Sales and Marketing
8.4.1 High Purity Sputtering Target for Semiconductor Sales Channels
8.4.2 High Purity Sputtering Target for Semiconductor Distributors
8.5 High Purity Sputtering Target for Semiconductor Customers
9 High Purity Sputtering Target for Semiconductor Market Dynamics
9.1 High Purity Sputtering Target for Semiconductor Industry Trends
9.2 High Purity Sputtering Target for Semiconductor Market Drivers
9.3 High Purity Sputtering Target for Semiconductor Market Challenges
9.4 High Purity Sputtering Target for Semiconductor Market Restraints
10 Research Finding and Conclusion
11 Methodology and Data Source
11.1 Methodology/Research Approach
11.1.1 Research Programs/Design
11.1.2 Market Size Estimation
11.1.3 Market Breakdown and Data Triangulation
11.2 Data Source
11.2.1 Secondary Sources
11.2.2 Primary Sources
11.3 Author List
11.4 Disclaimer

Companies Mentioned:

Linde
JX Nippon Mining & Metals Corporation
Materion
Honeywell
Ningbo Jiangfeng
ULVAC
TOSOH
Luvata
Hitachi Metals
Sumitomo Chemical
Plansee SE
FURAYA Metals Co., Ltd
Luoyang Sifon Electronic Materials
Changzhou Sujing Electronic Material
Umicore Thin Film Products
GRIKIN Advanced Material Co., Ltd.
Advantec
Angstrom Sciences

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