Sputtering is the process of forming a thin film when the object is attached to the target substrate by the sputtering and scattering, and the sputtering target is the material for high-speed particle bombardment. This report studies the sputtering target material market.
The global Sputtering Target Material for Semiconductor market is projected to reach US$ 1857.3 million in 2029, increasing from US$ 1453.8 million in 2022, with the CAGR of 3.8% during the period of 2023 to 2029. Influencing issues, such as economy environments, COVID-19 and Russia-Ukraine War, have led to great market fluctuations in the past few years and are considered comprehensively in the whole Sputtering Target Material for Semiconductor 91制片厂.
Following a strong growth of 26.2 percent in the year 2021, WSTS revised it down to a single digit growth for the worldwide semiconductor market in 2022 with a total size of US$580 billion, up 4.4 percent. WSTS lowered growth estimation as inflation rises and end markets seeing weaker demand, especially those exposed to consumer spending. While some major categories are still double-digit year-over-year growth in 2022, led by Analog with 20.8 percent, Sensors with 16.3 percent, and Logic with 14.5 percent growth. Memory declined with 12.6 percent year over year. In 2022, all geographical regions showed double-digit growth except Asia Pacific. The largest region, Asia Pacific, declined 2.0 percent. Sales in the Americas were US$142.1 billion, up 17.0% year-on-year, sales in Europe were US$53.8 billion, up 12.6% year-on-year, and sales in Japan were US$48.1 billion, up 10.0% year-on-year. However, sales in the largest Asia-Pacific region were US$336.2 billion, down 2.0% year-on-year.
Report Scope
This report, based on historical analysis (2018-2022) and forecast calculation (2023-2029), aims to help readers to get a comprehensive understanding of global Sputtering Target Material for Semiconductor market with multiple angles, which provides sufficient supports to readers鈥� strategy and decision making.
By Company
JX Nippon Mining & Metals Corporation
Praxair
Plansee SE
Mitsui Mining & Smelting
Hitachi Metals
Honeywell
Sumitomo Chemical
ULVAC
Materion (Heraeus)
GRIKIN Advanced Material Co., Ltd.
TOSOH
Ningbo Jiangfeng
Heesung
Luvata
Fujian Acetron New Materials Co., Ltd
Changzhou Sujing Electronic Material
Luoyang Sifon Electronic Materials
FURAYA Metals Co., Ltd
Advantec
Angstrom Sciences
Umicore Thin Film Products
TANAKA
Segment by Type
Metal Sputtering Target Material
Alloy Sputtering Target Material
Segment by Application
Analog IC
Digital IC
Analog/Digital IC
Production by Region
North America
Europe
China
Japan
Consumption by Region
North America
U.S.
Canada
Europe
Germany
France
U.K.
Italy
Russia
Asia-Pacific
China
Japan
South Korea
China Taiwan
Southeast Asia
India
Latin America, Middle East & Africa
Mexico
Brazil
Turkey
GCC Countries
The Sputtering Target Material for Semiconductor report covers below items:
Chapter 1: Product Basic Information (Definition, type and application)
Chapter 2: Manufacturers鈥� Competition Patterns
Chapter 3: Production Region Distribution and Analysis
Chapter 4: Country Level Sales Analysis
Chapter 5: Product Type Analysis
Chapter 6: Product Application Analysis
Chapter 7: Manufacturers鈥� Outline
Chapter 8: Industry Chain, Market Channel and Customer Analysis
Chapter 9: Market Opportunities and Challenges
Chapter 10: Market Conclusions
Chapter 11: Research Methodology and Data Source
Please Note - This is an on demand report and will be delivered in 2 business days (48 hours) post payment.
1 Sputtering Target Material for Semiconductor Market Overview
1.1 Product Definition
1.2 Sputtering Target Material for Semiconductor Segment by Type
1.2.1 Global Sputtering Target Material for Semiconductor Market Value Growth Rate Analysis by Type 2022 VS 2029
1.2.2 Metal Sputtering Target Material
1.2.3 Alloy Sputtering Target Material
1.3 Sputtering Target Material for Semiconductor Segment by Application
1.3.1 Global Sputtering Target Material for Semiconductor Market Value Growth Rate Analysis by Application: 2022 VS 2029
1.3.2 Analog IC
1.3.3 Digital IC
1.3.4 Analog/Digital IC
1.4 Global Market Growth Prospects
1.4.1 Global Sputtering Target Material for Semiconductor Production Value Estimates and Forecasts (2018-2029)
1.4.2 Global Sputtering Target Material for Semiconductor Production Capacity Estimates and Forecasts (2018-2029)
1.4.3 Global Sputtering Target Material for Semiconductor Production Estimates and Forecasts (2018-2029)
1.4.4 Global Sputtering Target Material for Semiconductor Market Average Price Estimates and Forecasts (2018-2029)
1.5 Assumptions and Limitations
2 Market Competition by Manufacturers
2.1 Global Sputtering Target Material for Semiconductor Production Market Share by Manufacturers (2018-2023)
2.2 Global Sputtering Target Material for Semiconductor Production Value Market Share by Manufacturers (2018-2023)
2.3 Global Key Players of Sputtering Target Material for Semiconductor, Industry Ranking, 2021 VS 2022 VS 2023
2.4 Global Sputtering Target Material for Semiconductor Market Share by Company Type (Tier 1, Tier 2 and Tier 3)
2.5 Global Sputtering Target Material for Semiconductor Average Price by Manufacturers (2018-2023)
2.6 Global Key Manufacturers of Sputtering Target Material for Semiconductor, Manufacturing Base Distribution and Headquarters
2.7 Global Key Manufacturers of Sputtering Target Material for Semiconductor, Product Offered and Application
2.8 Global Key Manufacturers of Sputtering Target Material for Semiconductor, Date of Enter into This Industry
2.9 Sputtering Target Material for Semiconductor Market Competitive Situation and Trends
2.9.1 Sputtering Target Material for Semiconductor Market Concentration Rate
2.9.2 Global 5 and 10 Largest Sputtering Target Material for Semiconductor Players Market Share by Revenue
2.10 Mergers & Acquisitions, Expansion
3 Sputtering Target Material for Semiconductor Production by Region
3.1 Global Sputtering Target Material for Semiconductor Production Value Estimates and Forecasts by Region: 2018 VS 2022 VS 2029
3.2 Global Sputtering Target Material for Semiconductor Production Value by Region (2018-2029)
3.2.1 Global Sputtering Target Material for Semiconductor Production Value Market Share by Region (2018-2023)
3.2.2 Global Forecasted Production Value of Sputtering Target Material for Semiconductor by Region (2024-2029)
3.3 Global Sputtering Target Material for Semiconductor Production Estimates and Forecasts by Region: 2018 VS 2022 VS 2029
3.4 Global Sputtering Target Material for Semiconductor Production by Region (2018-2029)
3.4.1 Global Sputtering Target Material for Semiconductor Production Market Share by Region (2018-2023)
3.4.2 Global Forecasted Production of Sputtering Target Material for Semiconductor by Region (2024-2029)
3.5 Global Sputtering Target Material for Semiconductor Market Price Analysis by Region (2018-2023)
3.6 Global Sputtering Target Material for Semiconductor Production and Value, Year-over-Year Growth
3.6.1 North America Sputtering Target Material for Semiconductor Production Value Estimates and Forecasts (2018-2029)
3.6.2 Europe Sputtering Target Material for Semiconductor Production Value Estimates and Forecasts (2018-2029)
3.6.3 China Sputtering Target Material for Semiconductor Production Value Estimates and Forecasts (2018-2029)
3.6.4 Japan Sputtering Target Material for Semiconductor Production Value Estimates and Forecasts (2018-2029)
4 Sputtering Target Material for Semiconductor Consumption by Region
4.1 Global Sputtering Target Material for Semiconductor Consumption Estimates and Forecasts by Region: 2018 VS 2022 VS 2029
4.2 Global Sputtering Target Material for Semiconductor Consumption by Region (2018-2029)
4.2.1 Global Sputtering Target Material for Semiconductor Consumption by Region (2018-2023)
4.2.2 Global Sputtering Target Material for Semiconductor Forecasted Consumption by Region (2024-2029)
4.3 North America
4.3.1 North America Sputtering Target Material for Semiconductor Consumption Growth Rate by Country: 2018 VS 2022 VS 2029
4.3.2 North America Sputtering Target Material for Semiconductor Consumption by Country (2018-2029)
4.3.3 U.S.
4.3.4 Canada
4.4 Europe
4.4.1 Europe Sputtering Target Material for Semiconductor Consumption Growth Rate by Country: 2018 VS 2022 VS 2029
4.4.2 Europe Sputtering Target Material for Semiconductor Consumption by Country (2018-2029)
4.4.3 Germany
4.4.4 France
4.4.5 U.K.
4.4.6 Italy
4.4.7 Russia
4.5 Asia Pacific
4.5.1 Asia Pacific Sputtering Target Material for Semiconductor Consumption Growth Rate by Region: 2018 VS 2022 VS 2029
4.5.2 Asia Pacific Sputtering Target Material for Semiconductor Consumption by Region (2018-2029)
4.5.3 China
4.5.4 Japan
4.5.5 South Korea
4.5.6 China Taiwan
4.5.7 Southeast Asia
4.5.8 India
4.6 Latin America, Middle East & Africa
4.6.1 Latin America, Middle East & Africa Sputtering Target Material for Semiconductor Consumption Growth Rate by Country: 2018 VS 2022 VS 2029
4.6.2 Latin America, Middle East & Africa Sputtering Target Material for Semiconductor Consumption by Country (2018-2029)
4.6.3 Mexico
4.6.4 Brazil
4.6.5 Turkey
5 Segment by Type
5.1 Global Sputtering Target Material for Semiconductor Production by Type (2018-2029)
5.1.1 Global Sputtering Target Material for Semiconductor Production by Type (2018-2023)
5.1.2 Global Sputtering Target Material for Semiconductor Production by Type (2024-2029)
5.1.3 Global Sputtering Target Material for Semiconductor Production Market Share by Type (2018-2029)
5.2 Global Sputtering Target Material for Semiconductor Production Value by Type (2018-2029)
5.2.1 Global Sputtering Target Material for Semiconductor Production Value by Type (2018-2023)
5.2.2 Global Sputtering Target Material for Semiconductor Production Value by Type (2024-2029)
5.2.3 Global Sputtering Target Material for Semiconductor Production Value Market Share by Type (2018-2029)
5.3 Global Sputtering Target Material for Semiconductor Price by Type (2018-2029)
6 Segment by Application
6.1 Global Sputtering Target Material for Semiconductor Production by Application (2018-2029)
6.1.1 Global Sputtering Target Material for Semiconductor Production by Application (2018-2023)
6.1.2 Global Sputtering Target Material for Semiconductor Production by Application (2024-2029)
6.1.3 Global Sputtering Target Material for Semiconductor Production Market Share by Application (2018-2029)
6.2 Global Sputtering Target Material for Semiconductor Production Value by Application (2018-2029)
6.2.1 Global Sputtering Target Material for Semiconductor Production Value by Application (2018-2023)
6.2.2 Global Sputtering Target Material for Semiconductor Production Value by Application (2024-2029)
6.2.3 Global Sputtering Target Material for Semiconductor Production Value Market Share by Application (2018-2029)
6.3 Global Sputtering Target Material for Semiconductor Price by Application (2018-2029)
7 Key Companies Profiled
7.1 JX Nippon Mining & Metals Corporation
7.1.1 JX Nippon Mining & Metals Corporation Sputtering Target Material for Semiconductor Corporation Information
7.1.2 JX Nippon Mining & Metals Corporation Sputtering Target Material for Semiconductor Product Portfolio
7.1.3 JX Nippon Mining & Metals Corporation Sputtering Target Material for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.1.4 JX Nippon Mining & Metals Corporation Main Business and Markets Served
7.1.5 JX Nippon Mining & Metals Corporation Recent Developments/Updates
7.2 Praxair
7.2.1 Praxair Sputtering Target Material for Semiconductor Corporation Information
7.2.2 Praxair Sputtering Target Material for Semiconductor Product Portfolio
7.2.3 Praxair Sputtering Target Material for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.2.4 Praxair Main Business and Markets Served
7.2.5 Praxair Recent Developments/Updates
7.3 Plansee SE
7.3.1 Plansee SE Sputtering Target Material for Semiconductor Corporation Information
7.3.2 Plansee SE Sputtering Target Material for Semiconductor Product Portfolio
7.3.3 Plansee SE Sputtering Target Material for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.3.4 Plansee SE Main Business and Markets Served
7.3.5 Plansee SE Recent Developments/Updates
7.4 Mitsui Mining & Smelting
7.4.1 Mitsui Mining & Smelting Sputtering Target Material for Semiconductor Corporation Information
7.4.2 Mitsui Mining & Smelting Sputtering Target Material for Semiconductor Product Portfolio
7.4.3 Mitsui Mining & Smelting Sputtering Target Material for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.4.4 Mitsui Mining & Smelting Main Business and Markets Served
7.4.5 Mitsui Mining & Smelting Recent Developments/Updates
7.5 Hitachi Metals
7.5.1 Hitachi Metals Sputtering Target Material for Semiconductor Corporation Information
7.5.2 Hitachi Metals Sputtering Target Material for Semiconductor Product Portfolio
7.5.3 Hitachi Metals Sputtering Target Material for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.5.4 Hitachi Metals Main Business and Markets Served
7.5.5 Hitachi Metals Recent Developments/Updates
7.6 Honeywell
7.6.1 Honeywell Sputtering Target Material for Semiconductor Corporation Information
7.6.2 Honeywell Sputtering Target Material for Semiconductor Product Portfolio
7.6.3 Honeywell Sputtering Target Material for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.6.4 Honeywell Main Business and Markets Served
7.6.5 Honeywell Recent Developments/Updates
7.7 Sumitomo Chemical
7.7.1 Sumitomo Chemical Sputtering Target Material for Semiconductor Corporation Information
7.7.2 Sumitomo Chemical Sputtering Target Material for Semiconductor Product Portfolio
7.7.3 Sumitomo Chemical Sputtering Target Material for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.7.4 Sumitomo Chemical Main Business and Markets Served
7.7.5 Sumitomo Chemical Recent Developments/Updates
7.8 ULVAC
7.8.1 ULVAC Sputtering Target Material for Semiconductor Corporation Information
7.8.2 ULVAC Sputtering Target Material for Semiconductor Product Portfolio
7.8.3 ULVAC Sputtering Target Material for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.8.4 ULVAC Main Business and Markets Served
7.7.5 ULVAC Recent Developments/Updates
7.9 Materion (Heraeus)
7.9.1 Materion (Heraeus) Sputtering Target Material for Semiconductor Corporation Information
7.9.2 Materion (Heraeus) Sputtering Target Material for Semiconductor Product Portfolio
7.9.3 Materion (Heraeus) Sputtering Target Material for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.9.4 Materion (Heraeus) Main Business and Markets Served
7.9.5 Materion (Heraeus) Recent Developments/Updates
7.10 GRIKIN Advanced Material Co., Ltd.
7.10.1 GRIKIN Advanced Material Co., Ltd. Sputtering Target Material for Semiconductor Corporation Information
7.10.2 GRIKIN Advanced Material Co., Ltd. Sputtering Target Material for Semiconductor Product Portfolio
7.10.3 GRIKIN Advanced Material Co., Ltd. Sputtering Target Material for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.10.4 GRIKIN Advanced Material Co., Ltd. Main Business and Markets Served
7.10.5 GRIKIN Advanced Material Co., Ltd. Recent Developments/Updates
7.11 TOSOH
7.11.1 TOSOH Sputtering Target Material for Semiconductor Corporation Information
7.11.2 TOSOH Sputtering Target Material for Semiconductor Product Portfolio
7.11.3 TOSOH Sputtering Target Material for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.11.4 TOSOH Main Business and Markets Served
7.11.5 TOSOH Recent Developments/Updates
7.12 Ningbo Jiangfeng
7.12.1 Ningbo Jiangfeng Sputtering Target Material for Semiconductor Corporation Information
7.12.2 Ningbo Jiangfeng Sputtering Target Material for Semiconductor Product Portfolio
7.12.3 Ningbo Jiangfeng Sputtering Target Material for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.12.4 Ningbo Jiangfeng Main Business and Markets Served
7.12.5 Ningbo Jiangfeng Recent Developments/Updates
7.13 Heesung
7.13.1 Heesung Sputtering Target Material for Semiconductor Corporation Information
7.13.2 Heesung Sputtering Target Material for Semiconductor Product Portfolio
7.13.3 Heesung Sputtering Target Material for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.13.4 Heesung Main Business and Markets Served
7.13.5 Heesung Recent Developments/Updates
7.14 Luvata
7.14.1 Luvata Sputtering Target Material for Semiconductor Corporation Information
7.14.2 Luvata Sputtering Target Material for Semiconductor Product Portfolio
7.14.3 Luvata Sputtering Target Material for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.14.4 Luvata Main Business and Markets Served
7.14.5 Luvata Recent Developments/Updates
7.15 Fujian Acetron New Materials Co., Ltd
7.15.1 Fujian Acetron New Materials Co., Ltd Sputtering Target Material for Semiconductor Corporation Information
7.15.2 Fujian Acetron New Materials Co., Ltd Sputtering Target Material for Semiconductor Product Portfolio
7.15.3 Fujian Acetron New Materials Co., Ltd Sputtering Target Material for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.15.4 Fujian Acetron New Materials Co., Ltd Main Business and Markets Served
7.15.5 Fujian Acetron New Materials Co., Ltd Recent Developments/Updates
7.16 Changzhou Sujing Electronic Material
7.16.1 Changzhou Sujing Electronic Material Sputtering Target Material for Semiconductor Corporation Information
7.16.2 Changzhou Sujing Electronic Material Sputtering Target Material for Semiconductor Product Portfolio
7.16.3 Changzhou Sujing Electronic Material Sputtering Target Material for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.16.4 Changzhou Sujing Electronic Material Main Business and Markets Served
7.16.5 Changzhou Sujing Electronic Material Recent Developments/Updates
7.17 Luoyang Sifon Electronic Materials
7.17.1 Luoyang Sifon Electronic Materials Sputtering Target Material for Semiconductor Corporation Information
7.17.2 Luoyang Sifon Electronic Materials Sputtering Target Material for Semiconductor Product Portfolio
7.17.3 Luoyang Sifon Electronic Materials Sputtering Target Material for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.17.4 Luoyang Sifon Electronic Materials Main Business and Markets Served
7.17.5 Luoyang Sifon Electronic Materials Recent Developments/Updates
7.18 FURAYA Metals Co., Ltd
7.18.1 FURAYA Metals Co., Ltd Sputtering Target Material for Semiconductor Corporation Information
7.18.2 FURAYA Metals Co., Ltd Sputtering Target Material for Semiconductor Product Portfolio
7.18.3 FURAYA Metals Co., Ltd Sputtering Target Material for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.18.4 FURAYA Metals Co., Ltd Main Business and Markets Served
7.18.5 FURAYA Metals Co., Ltd Recent Developments/Updates
7.19 Advantec
7.19.1 Advantec Sputtering Target Material for Semiconductor Corporation Information
7.19.2 Advantec Sputtering Target Material for Semiconductor Product Portfolio
7.19.3 Advantec Sputtering Target Material for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.19.4 Advantec Main Business and Markets Served
7.19.5 Advantec Recent Developments/Updates
7.20 Angstrom Sciences
7.20.1 Angstrom Sciences Sputtering Target Material for Semiconductor Corporation Information
7.20.2 Angstrom Sciences Sputtering Target Material for Semiconductor Product Portfolio
7.20.3 Angstrom Sciences Sputtering Target Material for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.20.4 Angstrom Sciences Main Business and Markets Served
7.20.5 Angstrom Sciences Recent Developments/Updates
7.21 Umicore Thin Film Products
7.21.1 Umicore Thin Film Products Sputtering Target Material for Semiconductor Corporation Information
7.21.2 Umicore Thin Film Products Sputtering Target Material for Semiconductor Product Portfolio
7.21.3 Umicore Thin Film Products Sputtering Target Material for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.21.4 Umicore Thin Film Products Main Business and Markets Served
7.21.5 Umicore Thin Film Products Recent Developments/Updates
7.22 TANAKA
7.22.1 TANAKA Sputtering Target Material for Semiconductor Corporation Information
7.22.2 TANAKA Sputtering Target Material for Semiconductor Product Portfolio
7.22.3 TANAKA Sputtering Target Material for Semiconductor Production, Value, Price and Gross Margin (2018-2023)
7.22.4 TANAKA Main Business and Markets Served
7.22.5 TANAKA Recent Developments/Updates
8 Industry Chain and Sales Channels Analysis
8.1 Sputtering Target Material for Semiconductor Industry Chain Analysis
8.2 Sputtering Target Material for Semiconductor Key Raw Materials
8.2.1 Key Raw Materials
8.2.2 Raw Materials Key Suppliers
8.3 Sputtering Target Material for Semiconductor Production Mode & Process
8.4 Sputtering Target Material for Semiconductor Sales and Marketing
8.4.1 Sputtering Target Material for Semiconductor Sales Channels
8.4.2 Sputtering Target Material for Semiconductor Distributors
8.5 Sputtering Target Material for Semiconductor Customers
9 Sputtering Target Material for Semiconductor Market Dynamics
9.1 Sputtering Target Material for Semiconductor Industry Trends
9.2 Sputtering Target Material for Semiconductor Market Drivers
9.3 Sputtering Target Material for Semiconductor Market Challenges
9.4 Sputtering Target Material for Semiconductor Market Restraints
10 Research Finding and Conclusion
11 Methodology and Data Source
11.1 Methodology/Research Approach
11.1.1 Research Programs/Design
11.1.2 Market Size Estimation
11.1.3 Market Breakdown and Data Triangulation
11.2 Data Source
11.2.1 Secondary Sources
11.2.2 Primary Sources
11.3 Author List
11.4 Disclaimer
JX Nippon Mining & Metals Corporation
Praxair
Plansee SE
Mitsui Mining & Smelting
Hitachi Metals
Honeywell
Sumitomo Chemical
ULVAC
Materion (Heraeus)
GRIKIN Advanced Material Co., Ltd.
TOSOH
Ningbo Jiangfeng
Heesung
Luvata
Fujian Acetron New Materials Co., Ltd
Changzhou Sujing Electronic Material
Luoyang Sifon Electronic Materials
FURAYA Metals Co., Ltd
Advantec
Angstrom Sciences
Umicore Thin Film Products
TANAKA
听
听
*If Applicable.
