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Your search for "multi-angle light sputtering (walls)" gave back 365669 results.
Manganese Sulfide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Iron Silicide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical...
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MRRPB5
November 2024
Price: USD 3,950.00
Nickel Telluride (NiTe) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display...
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MRRPB5
November 2024
Price: USD 3,950.00
Niobium Selenide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Zirconium Silicide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Niobium Silicide (NbSi2) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display...
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MRRPB5
November 2024
Price: USD 3,950.00
Iron Boride Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical...
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MRRPB5
November 2024
Price: USD 3,950.00
The aluminum scandium sputtering target is a type of film coating material made of aluminum scandium alloy. The global market for AlSc Sputtering...
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MRRPB5
November 2024
Price: USD 3,950.00
First discovered in 1852 and developed as a thin film deposition technique in 1920, sputtering targets are a physical vapor deposition mechanism鈥攁n...
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MRRPB5
November 2024
Price: USD 3,950.00
The global High Purity Alloy Sputtering Target market size was valued at US$ 4207 million in 2024 and is forecast to a readjusted size of USD 5205...
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GIR
February 2025
Price: USD 3,480.00
Optical parts sputtering equipment enables greater precision and flexibility in thin film processes. Optical part sputtering equipment features a...
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MRRPB5
November 2024
Price: USD 3,950.00
Magnetron sputtering apparatus is a sputtering evaporation instrument applied to various metal thin films The global market for Magnetron Sputtering...
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MRRPB5
October 2024
Price: USD 3,950.00
The global Low-E Glass Magnetron Sputtering Coating Line market size was valued at US$ million in 2024 and is forecast to a readjusted size of USD...
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GIR
March 2025
Price: USD 3,480.00
The global market for In-line Vertical Sputtering System was estimated to be worth US$ million in 2023 and is forecast to a readjusted size of US$...
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MRRPB5
November 2024
Price: USD 3,950.00
First discovered in 1852 and developed as a thin film deposition technique in 1920, sputtering targets are a physical vapor deposition mechanism鈥攁n...
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MRRPB5
November 2024
Price: USD 3,950.00
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