0 items USD 0.00Search
- Did you mean
- multi-angle light sputtering (walls)
Your search for "multi-angle light sputtering (malls)" gave back 346698 results.
Tungsten Selenide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
颁补迟补濒辞驳:听
MRRPB5
November 2024
Price: USD 3,950.00
Iron Carbide (Fe3C) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
颁补迟补濒辞驳:听
MRRPB5
November 2024
Price: USD 3,950.00
Sputtering targets for semiconductors embody a wealth of metal product manufacturing technologies, including high-purity and alloying technologies...
颁补迟补濒辞驳:听
MRRPB5
November 2024
Price: USD 3,950.00
Sodium Oxide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical...
颁补迟补濒辞驳:听
MRRPB5
November 2024
Price: USD 3,950.00
Potassium Oxide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
颁补迟补濒辞驳:听
MRRPB5
November 2024
Price: USD 3,950.00
Thorium Oxide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical...
颁补迟补濒辞驳:听
MRRPB5
November 2024
Price: USD 3,950.00
Aluminum scandium sputter targets are superior to other aerospace alloys such as aluminum magnesium and aluminum lithium alloys in terms of low...
颁补迟补濒辞驳:听
MRRPB5
November 2024
Price: USD 3,950.00
Tungsten carbide (WC) is used for the production of DLC coatings (Diamond Like Carbon). WC targets are particularly hard and long-lasting and protect...
颁补迟补濒辞驳:听
MRRPB5
November 2024
Price: USD 3,950.00
High-performance sputtering targets are target materials that are bombarded by high-speed ion currents during the sputtering process. They are raw...
颁补迟补濒辞驳:听
MRRPB5
November 2024
Price: USD 3,950.00
The global market for Semiconductor Used High Purity Metal Sputtering Target Material was valued at US$ million in the year 2024 and is projected to...
颁补迟补濒辞驳:听
MRRPB5
January 2025
Price: USD 2,900.00
Sputtering Equipment for Ceramic Substrate first evacuates the chamber to a high vacuum to minimize the partial pressure of all background gases and...
颁补迟补濒辞驳:听
MRRPB5
November 2024
Price: USD 3,950.00
The iron aluminum sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional...
颁补迟补濒辞驳:听
MRRPB5
November 2024
Price: USD 3,950.00
The barium sulfide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional...
颁补迟补濒辞驳:听
MRRPB5
November 2024
Price: USD 3,950.00
Aluminum Chromium Sputtering Target has the highest possible density and the smallest possible average grain size for semiconductor, chemical vapor...
颁补迟补濒辞驳:听
MRRPB5
November 2024
Price: USD 3,950.00
Aluminium Boride Sputtering Targets has the highest possible density and the smallest possible average grain size for semiconductor, chemical vapor...
颁补迟补濒辞驳:听
MRRPB5
November 2024
Price: USD 3,950.00
听
