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Your search for "multi-angle light sputtering (malls)" gave back 346569 results.
Hafnium Boride (HfB2) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Zirconium Carbide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Bismuth (Bi) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical...
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MRRPB5
November 2024
Price: USD 3,950.00
Gallium selenide sputtering target is a type of selenide ceramic sputtering target composed of gallium and selenium. The global market for Gallium...
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MRRPB5
November 2024
Price: USD 3,950.00
Indium Gallium Zinc Oxide (IGZO) is a semiconducting material, consisting of indium (In), gallium (Ga), zinc (Zn) and oxygen (O). IGZO (Indium...
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MRRPB5
December 2024
Price: USD 4,900.00
Sputter coating in scanning electron microscopy is a sputter deposition process to cover a specimen with a thin layer of conducting material,...
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MRRPB5
September 2024
Price: USD 3,950.00
Beryllium Oxide Sputtering Target has the highest possible density and the smallest possible average grain size for semiconductor, chemical vapor...
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MRRPB5
November 2024
Price: USD 3,950.00
Aluminum Neodymium Sputtering Target has the highest possible density and the smallest possible average grain size for semiconductor, chemical vapor...
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MRRPB5
November 2024
Price: USD 3,950.00
Indium Antimonide Sputtering Target has the highest possible density and the smallest possible average grain size for semiconductor, chemical vapor...
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MRRPB5
November 2024
Price: USD 3,950.00
Gallium Antimonide Sputtering Target has the highest possible density and the smallest possible average grain size for semiconductor, chemical vapor...
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MRRPB5
November 2024
Price: USD 3,950.00
Arsenic Sulfide Sputtering Target has the highest possible density and the smallest possible average grain size for semiconductor, chemical vapor...
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MRRPB5
November 2024
Price: USD 3,950.00
Iridium oxide sputtering target is used for thin film deposition, typically for fuel cell, decoration, semiconductor, display, LED and photovoltaic...
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MRRPB5
November 2024
Price: USD 3,950.00
Ruthenium Oxide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Hafnium Fluoride Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Aluminum Boron Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical...
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MRRPB5
November 2024
Price: USD 3,950.00
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