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Your search for "technetium-99m" gave back 88906 results.
Cadmium Selenide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Copper Sulfide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical...
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MRRPB5
November 2024
Price: USD 3,950.00
Zirconium Boride Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Hafnium foil is a high purity hafnium metal foil made by special mechanical pressing. It can be used as control rod and protection device of atomic...
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MRRPB5
November 2024
Price: USD 3,950.00
Germanium Telluride (GeTe) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display...
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MRRPB5
November 2024
Price: USD 3,950.00
Lead Sulfide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical...
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MRRPB5
November 2024
Price: USD 3,950.00
Indium Sulfide (In2S3) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Tungsten Silicide (WSi2) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display...
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MRRPB5
November 2024
Price: USD 3,950.00
Lead Selenide (PbSe) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Tantalum Silicide (TaSi2) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display...
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MRRPB5
November 2024
Price: USD 3,950.00
Tin Sulfide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical...
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MRRPB5
November 2024
Price: USD 3,950.00
Titanium Selenide (TiSe2) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display...
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MRRPB5
November 2024
Price: USD 3,950.00
Tantalum Selenide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
°ä²¹³Ù²¹±ô´Ç²µ:Ìý
MRRPB5
November 2024
Price: USD 3,950.00
Molybdenum Selenide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Indium Selenide (In2Se3) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display...
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MRRPB5
November 2024
Price: USD 3,950.00

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