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Your search for "technetium-99m" gave back 89164 results.
Aluminum Cobalt Sputtering Target has the highest possible density and the smallest possible average grain size for semiconductor, chemical vapor...
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MRRPB5
May 2024
Price: USD 2,900.00
The aluminum copper sputtering target is made of high-quality aluminum copper alloys. Aluminum copper alloys are most valued for their higher...
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MRRPB5
May 2024
Price: USD 2,900.00
Erbium(III) Phosphate Hydrate is a chemical with the chemical formula ErPO4.XH2O The global Erbium (III) Phosphate Hydrate market was valued at US$...
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MRRPB5
May 2024
Price: USD 2,900.00
Aluminum Neodymium Sputtering Target has the highest possible density and the smallest possible average grain size for semiconductor, chemical vapor...
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MRRPB5
May 2024
Price: USD 2,900.00
Beryllium is a chemical element with the symbol Be and atomic number 4. It is a relatively rare element in the universe, usually occurring as a...
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MRRPB5
May 2024
Price: USD 2,900.00
The barium sulfide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional...
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MRRPB5
May 2024
Price: USD 2,900.00
Gallium Arsenide Sputtering Target has the highest possible density and the smallest possible average grain size for semiconductor, chemical vapor...
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MRRPB5
May 2024
Price: USD 2,900.00
Arsenic Sulfide Sputtering Target has the highest possible density and the smallest possible average grain size for semiconductor, chemical vapor...
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MRRPB5
May 2024
Price: USD 2,900.00
Arsenic Selenide Sputtering Target has the highest possible density and the smallest possible average grain size for semiconductor, chemical vapor...
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MRRPB5
May 2024
Price: USD 2,900.00
Cesium is a chemical element with the symbol Cs and atomic number 55. It is a soft, silvery-golden alkali metal with a melting point of 28.5 掳C (83.3...
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MRRPB5
May 2024
Price: USD 2,900.00
Calcium sputtering target has the same properties as metal calcium. Calcium鈥檚 primary commercial application is as a reducing agent in the production...
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MRRPB5
May 2024
Price: USD 2,900.00
Indium Antimonide Sputtering Target has the highest possible density and the smallest possible average grain size for semiconductor, chemical vapor...
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MRRPB5
May 2024
Price: USD 2,900.00
Aluminum Chromium Sputtering Target has the highest possible density and the smallest possible average grain size for semiconductor, chemical vapor...
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MRRPB5
May 2024
Price: USD 2,900.00
Gallium Antimonide Sputtering Target has the highest possible density and the smallest possible average grain size for semiconductor, chemical vapor...
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MRRPB5
May 2024
Price: USD 2,900.00
The iron aluminum sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional...
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MRRPB5
May 2024
Price: USD 2,900.00
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