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Your search for "multi-angle light sputtering (malls)" gave back 346585 results.
Manganese sputtering target is composed of high purity manganese metal. Manganese is a chemical element originated from Either the Latin 鈥榤agnes鈥�,...
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MRRPB5
November 2024
Price: USD 3,950.00
Lithium Fluoride Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Vanadium Carbide (VC) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
The global market for SiO鈧� Sputtered Coating was estimated to be worth US$ million in 2023 and is forecast to a readjusted size of US$ million by...
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MRRPB5
December 2024
Price: USD 3,950.00
The global High Purity Alloy Sputtering Target market size was valued at US$ 4207 million in 2024 and is forecast to a readjusted size of USD 5205...
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GIR
February 2025
Price: USD 3,480.00
The global Low-E Glass Magnetron Sputtering Coating Line market size was valued at US$ million in 2024 and is forecast to a readjusted size of USD...
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GIR
March 2025
Price: USD 3,480.00
The lutetium oxide Lu2O3 sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices,...
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MRRPB5
November 2024
Price: USD 3,950.00
Titanium Dioxide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Lead sputtering targets are used in semiconductor, chemical vapor deposition, physical vapor deposition and other applications. The global market for...
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MRRPB5
November 2024
Price: USD 3,950.00
Zirconium Tungsten (Zr/W) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display...
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MRRPB5
November 2024
Price: USD 3,950.00
Cobalt Nickel Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical...
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MRRPB5
November 2024
Price: USD 3,950.00
Chromium Silicon Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Cobalt Iron Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical...
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MRRPB5
November 2024
Price: USD 3,950.00
Manganese Sulfide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Iron Silicide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical...
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MRRPB5
November 2024
Price: USD 3,950.00
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