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Gadolinium sputtering target is a kind of high purity gadolinium raw material by sputtering deposition. According to the different shapes, gadolinium...
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MRRPB5
November 2024
Price: USD 3,950.00
Palladium sputtering target shares properties with its source material. Palladium is a member of the platinum group of metals. It is a lustrous...
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MRRPB5
November 2024
Price: USD 3,950.00
Magnesium Fluoride Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Titanium Nitride Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Silicon Carbide (SiC) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
The global market for Ultra Pure Sputtering Target Material was estimated to be worth US$ million in 2023 and is forecast to a readjusted size of US...
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MRRPB5
November 2024
Price: USD 3,950.00
It refers to the use of the interaction between the magnetic field and the electric field to make the electrons run in a spiral shape near the target...
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MRRPB5
November 2024
Price: USD 3,950.00
Cadmium sulfide sputtering target is a type of sulfide ceramic sputtering target composed of cadmium and sulfur. The global market for Cadmium...
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MRRPB5
November 2024
Price: USD 3,950.00
Sputter deposition is an important step in semiconductor fabrication. It is widely used to deposit thin films of different materials on substrates...
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MRRPB5
November 2024
Price: USD 3,950.00
Terbium sputtering target is made of Terbium metal. Terbium is a silvery-white, rare earth metal that is malleable, ductile, and soft enough to be...
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MRRPB5
November 2024
Price: USD 3,950.00
Cerium sputtering target has the same properties as metal cerium. Cerium is a chemical element originated from Ceres, the Roman God of agriculture...
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MRRPB5
November 2024
Price: USD 3,950.00
Magnesium Oxide (MgO) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Samarium Oxide (Sm2O3) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Cobalt sputtering target has the same properties as the metal cobalt. cobaltCobalt is a chemical element originated from the German word 鈥榢obald鈥�,...
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MRRPB5
November 2024
Price: USD 3,950.00
Neodymium sputtering target is composed of high purity neodymium metal. Neodymium is a chemical element that originated from the Greek 鈥榥eos didymos...
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MRRPB5
November 2024
Price: USD 3,950.00
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