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Your search for "multi-angle light sputtering (malls)" gave back 346750 results.
Aluminum Manganese Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Magnesium Sulfide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Tungsten Boride Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Magnetron sputtering coating is a new type of physical vapor deposition method, which uses an electron gun system to emit and focus electrons on the...
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MRRPB5
November 2024
Price: USD 3,950.00
Sputtering technique are frequently used to create a thin film of Antimony Telluride . The Sb2Te3 target material is placed on the electrode in the...
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MRRPB5
November 2024
Price: USD 3,950.00
Samarium sputtering target is a silvery target composed of high purity samarium metal. Samarium is a chemical element originated from Samarskite, the...
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MRRPB5
November 2024
Price: USD 3,950.00
Germanium sputtering target is composed of high purity Germanium metal. Germanium is a chemical element originated from Germany (with the Latin name...
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MRRPB5
November 2024
Price: USD 3,950.00
Yttrium Oxide (Y2O3) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Iridium sputtering target has the same properties as Iridium metal. Iridium is a rare, hard, lustrous, brittle, very dense platinum-like metal...
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MRRPB5
November 2024
Price: USD 3,950.00
Cadmium Telluride (CdTe) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display...
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MRRPB5
November 2024
Price: USD 3,950.00
Hafnium Carbide (HfC) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Molybdenum Disulfide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Molybdenum Disilicide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Lanthanum Boride Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Silicon carbide (SiC) sputtering targets for semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical...
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MRRPB5
November 2024
Price: USD 3,950.00
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