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Your search for "multi-angle light sputtering (malls)" gave back 346750 results.
The titanium sputtering target is made of titanium metal. It is a low-strength, high-strength metal with good ductility (especially in an oxygen-free...
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MRRPB5
November 2024
Price: USD 3,950.00
Vacuum sputter equipment, also known as sputtering systems or physical vapor deposition (PVD) equipment, is a type of machinery used for thin film...
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MRRPB5
November 2024
Price: USD 3,950.00
The global market for Electride Sputtering Target was estimated to be worth US$ million in 2023 and is forecast to a readjusted size of US$ million...
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MRRPB5
September 2024
Price: USD 3,950.00
Magnetron Sputtering Winding Coating Equipment is a high-efficiency physical vapor deposition (PVD) system designed for depositing thin films on...
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LPI
November 2024
Price: USD 3,660.00
The global High Purity Metal Sputtering Target Material market size was valued at USD million in 2023 and is forecast to a readjusted size of USD...
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GIR
December 2024
Price: USD 3,480.00
The iron oxide Fe2O3 sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional...
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MRRPB5
November 2024
Price: USD 3,950.00
The gadolinium oxide Gd2O3 sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices,...
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MRRPB5
November 2024
Price: USD 3,950.00
The dysprosium oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional...
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MRRPB5
November 2024
Price: USD 3,950.00
Tungsten Oxide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical...
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MRRPB5
November 2024
Price: USD 3,950.00
Germanium Nitride (Ge3N4) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display...
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MRRPB5
November 2024
Price: USD 3,950.00
Lanthanum Fluoride Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Gallium Telluride (Ga2Te3) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display...
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MRRPB5
November 2024
Price: USD 3,950.00
Germanium Selenide (GeSe2) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display...
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MRRPB5
November 2024
Price: USD 3,950.00
Hafnium Silicide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Manganese Telluride (MnTe) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display...
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MRRPB5
November 2024
Price: USD 3,950.00
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