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Your search for "multi-angle light sputtering (malls)" gave back 347528 results.
Sputtering targets are essential components used in the sputter deposition process, a common technique for depositing thin films onto electronic...
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MRRPB5
November 2024
Price: USD 3,950.00
The bismuth oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional...
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MRRPB5
November 2024
Price: USD 3,950.00
The lanthanum oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional...
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MRRPB5
November 2024
Price: USD 3,950.00
The nickel chromium sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional...
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MRRPB5
November 2024
Price: USD 3,950.00
Molybdenum Telluride (MoTe2) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD)...
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MRRPB5
November 2024
Price: USD 3,950.00
Boron Nitride Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical...
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MRRPB5
November 2024
Price: USD 3,950.00
Bismuth Telluride (Bi2Te3) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display...
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MRRPB5
November 2024
Price: USD 3,950.00
Lithium phosphate (Li3PO4)-sputtering target can be used as a thin-film electrolyte for the manufacture of various energy storage devices (lithium...
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MRRPB5
November 2024
Price: USD 3,950.00
Magnesium Zinc Oxide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
Cerium Copper Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical...
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MRRPB5
November 2024
Price: USD 3,950.00
Aluminum Copper Tungsten Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display...
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MRRPB5
November 2024
Price: USD 3,950.00
Platinum Silicide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
The global market for Sputter System was estimated to be worth US$ million in 2023 and is forecast to a readjusted size of US$ million by 2030 with a...
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MRRPB5
September 2024
Price: USD 3,950.00
Sputtering Cathode is the core component of the magnetron sputtering device. It is divided into flat (rectangular/circular) sputtering cathode and...
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MRRPB5
August 2024
Price: USD 4,900.00
Zinc Sulfide (ZnS) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
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MRRPB5
November 2024
Price: USD 3,950.00
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